NEW Pelcotec™ Etched Si CDMS ISO
Critical Dimension Magnification Standard

Easy to use and very useful for quick and precise SEM, FE-SEM, FIB, CD-SEM, LM, and AFM magnification calibration in the X axis from the etched lines.

Fully-featured and traceable calibration standards for a wide measurement range. They are made using the latest semiconductor and MEMS manufacturing techniques for etching features yielding superior line edge quality (Line edge roughness of +/- 0.3nm per 1um length of line edge) and are ideal for low keV imaging (≤1keV).

The Pelcotec™ Etched Si CDMS Calibration Standard is available in two feature size ranges individually certified to a NIST standard in an ISO 17205:2017 accredited calibration laboratory. Recertification of these ISO critical dimension standards in an ISO 17205:2017 accredited calibration laboratory is available.

Pelcotec™ Etched Si CDMS-1T-ISO
Fully traceable at the wafer level to a NIST standard (ISO 17025:2017 Sampling Scope of Accreditation). Has features from 2.0mm to 1um for a magnification range from 10x - 20,000x; ideal for desktop SEMs and low to medium magnification applications.
Representative CDMS-1T-ISO Traceable Certificate (325KB PDF)

Pelcotec™ Etched Si CDMS -0.1T-ISO
Fully traceable at the wafer level to a NIST standard (ISO 17025:2017 Sampling Scope of Accreditation). Has features from 2.0mm to 100nm for a magnification range from 10x - 200,000x; for all SEM and most FE-SEM applications.
Representative CDMS-0.1T-ISO Traceable Certificate (328KB PDF)

* Pelcotec™ Etched Si CDMS-1C-ISO
Individually certified in an ISO 17205:2017 accredited calibration laboratory against a NIST standard. Has features from 2.0mm to 1µm for a magnification range from 10x - 20,000x; ideal for desk top SEMs and low to medium magnification applications.
Representative CDMS-1C-ISO Conformance Certificate (3680KB PDF)

* Pelcotec™ Etched Si CDMS-0.1C-ISO
Individually certified in an ISO 17205:2017 accredited calibration laboratory against a NIST standard with features from 2.0mm to 100nm for a magnification range up to 10x - 200,000x; for all SEM and most FE-SEM applications.
Representative CDMS-0.1C-ISO Conformance Certificate (477KB PDF)

Pelcotec™ Technical Notes for CDMS ISO - Critical Dimension Magnification Standards (149KB PDF)

* Recertification in an ISO 17025:2017 accredited calibration laboratory available.

Comparison Table Below

Feature sizes for the Pelcotec™ Etched Si CDMS-1T-IS0 and -1C-ISO are:
2mm, 1mm, 0.5mm, 0.25mm, 10µm, 5µm, 2µm and 1µm

Feature sizes for the Pelcotec™ Etched Si CDMS-0.1T-ISO and -0.1C-ISO are:
2mm, 1mm, 0.5mm, 0.25mm, 10µm, 5µm, 2µm, 1µm, 500nm, 250nm and 100nm

The Pelcotec™ Etched Si CDMS ISO Critical Dimensions and Magnification Standards are made on an ultra flat silicon substrate with a precision etched lines for features sets from 100nm to 2µm. Due to its sturdy construction, the CDMS standard can be cleaned using a plasma cleaner on low settings.

The smaller features are nested for easy navigation and quick calibration. The accuracy of the features is 0.3% or better. The actual size of the standard is 2.5 x 2.5mm with a thickness of 525µm ±10µm. There is no coating on the Si surface. Each Pelcotec™ Etched Si CDMS ISO Calibration Standard has a unique identification number.

They are available either unmounted or mounted on SEM holders A-R. For AFM applications the Pelcotec™ Etched Si CDMS ISO is mounted on a 12mm AFM disc; for LM applications it is mounted on a 25 x 75mm glass slide.

The Etched Si CDMS standard may also be mounted on a custom mount of your choice.

Store the Pelcotec™ Etched Si CDMS ISO Calibration Standard in a vacuum desiccator such as the PELCO® SEM Sample Stub Vacuum Desiccator.

NEW Pelcotec™ Etched Si CDMS-1T-ISO

Traceable at the wafer level to a NIST standard (ISO 17025:2017 Sampling Scope of Accreditation) with features from 2mm to 1µm for magnification 10x-20,000x, ideal for desktop SEM.

Feature sizes: 2mm, 1mm, 0.5mm, 0.25mm, 10µm, 5µm, 2µm, and 1µm

See SEM mount selections, types A-R

NEW Pelcotec™ Etched Si CDMS-0.1T-ISO

Traceable at the wafer level to NIST standard (ISO 17025:2017 Sampling Scope of Accreditation) with features from 2mm to 100nm for magnification 10x-200,000x for SEM, FE-SEM and FIB.

Feature sizes: 2mm, 1mm, 0.5mm, 0.25mm, 10µm, 5µm, 2µm, 1µm, 500nm, 250nm, and 100nm

See SEM mount selections, types A-R

NEW Pelcotec™ Etched Si CDMS-1C-ISO

Certified to a NIST standard in an ISO 17205:2017 accredited calibration lab with features from 2mm to 1µm for magnification 10x-20,000x, ideal for desktop SEM.

Feature sizes: 2mm, 1mm, 0.5mm, 0.25mm, 10µm, 5µm, 2µm, and 1µm

Recertification service in an ISO 17025:2017 accredited calibration laboratory available (see #711-1-RECERT in the product table below).

See SEM mount selections, types A-R

NEW Pelcotec™ Etched Si CDMS-0.1C-ISO

Certified to a NIST standard in an ISO 17205:2017 accredited calibration lab with features from 2mm to 100nm for magnification 10x-200,000x for SEM, FE-SEM and FIB.

Feature sizes: 2mm, 1mm, 0.5mm, 0.25mm, 10µm, 5µm, 2µm, 1µm, 500nm, 250nm, and 100nm

Recertification service in an ISO 17025:2017 accredited calibration laboratory available (see #712-01-RECERT in the product table below).

See SEM mount selections, types A-R