Silicon Aperture Frames (without support film)

The PELCO^® Silicon Aperture Frames are 3mm disc-type frames with a thickness of 200µm and square or rectangular apertures. They are useful for a variety of applications:

Support frame to attach TEM lamellae made with FIB
Support frame for thin films, foils, wires and fibers
Mask for thin film research (deposition mask)

Detailed Measurements of Apertures

Product Specifications

Single Aperture Opening Sizes: 0.25 x 0.25mm, 0.5 x 0.5mm, 0.75 x 0.75mm, 1 x 1mm, and 0.5 x 1.5mm
Multiple Aperture Opening Sizes: 9 windows of 0.1 x 0.1mm in a 3 x 3 array or 2 windows of 0.1 x 1.5mm
Window Side Angle: 35.26°
Aperture Frame Thickness: 200µm
Aperture Frame Diameter: 3mm
Aperture Material: Si
Surface: Top side Si, back side (larger opening) has 50nm layer of Silicon Nitride for single aperture and 15nm Silicon Nitride for multiple apertures.
Packaging: The PELCO^® Silicon Aperture Frames are packaged under cleanroom conditions in a small vial holding 10 discs.

SDS (367KB PDF)

Made in USA

Prod #

Description

Unit

Price

Order / Quote

21545-10

PELCO^® Silicon Aperture Frame (no support film), 0.25x0.25mm

vial/10

$125.00

Qty:

21540-10

PELCO^® Silicon Aperture Frame (no support film), 0.5x0.5mm

vial/10

125.00

Qty:

21543-10

PELCO^® Silicon Aperture Frame (no support film), 0.75x0.75mm

vial/10

125.00

Qty:

21541-10

PELCO^® Silicon Aperture Frame (no support film), 1.0x1.0mm

vial/10

125.00

Qty:

21542-10

PELCO^® Silicon Aperture Frame (no support film), 0.5x1.5mm

vial/10

125.00

Qty:

21548-10

PELCO^® Silicon Aperture Frame (no support film), with 2 each 0.1x1.5mm apertures

vial/10

125.00

Qty:

21549-10

PELCO^® Silicon Aperture Frame (no support film), with 9 each 0.1x0.1mm apertures

vial/10

125.00

Qty:

PELCO^® Silicon Nitride Coated and Silicon Ø3mm Discs (blanks)

Silicon Nitride Disks for SEM, FESEM, AFM
Silicon Nitride Blank

These 3mm Silicon discs have an ultra-flat (Ra 0.45 ± 0.2nm) 50nm ultra-low-stress Silicon Nitride layer on both sides. Also available with a hydrophilic or hydrophobic surface coating or just as a silicon disk. The disks are made with the same state-of-the-art manufacturing techniques as the PELCO^®Silicon Nitride Support Films. The disk are perfectly round and have the Easygrip™ edge for easy handling. Clean surface, no broken edges and free of debris often associated with other manufacturing processes. The ultra-low-stress film is nonstoichiometric and closer to SiN than Si3N4. They can be used for a number of applications:

Specimen mounts for SEM and FESEM applications
Specimen discs for AFM applications
Blanks to build the PELCO® Liquid Cell™ together with the PELCO^® Silicon Nitride Membrane

Product Specifications

Film Thickness: 50nm ultra-low-stress Silicon Nitride on both sides
Hydrophilic: 5nm atomic layer-deposited hydroxylated alumina on 50nm ultra-low-stress silicon nitride More Details
Hydrophobic: 5nm atomic layer-deposited alumina and fluoro-methylsilane on ultra-low-stress silicon nitride. More Details
Disk Thickness: 200µm silicon support
Disk Diameter: 3mm
Surface Roughness: The RMS (Rq) is 0.65 +/- 0.06nm which gives a mean roughness (Ra) of 0.45 +/- 0.02nm
Packaging: The PELCO^® Silicon Nitride Discs with hydrophilic or hydrophobic coating are packaged under cleanroom conditions. The discs are packed in a vial holding 10 discs.

SDS (367KB PDF)

Made in USA

Prod #

Description

Unit

Price

Order / Quote

21555-10

PELCO^® Silicon Nitride Coated Discs, Ø3mm

vial/10

$115.00

Qty:

21556-10

PELCO^® Silicon Nitride Coated Discs with hydrophilic coating, Ø3mm

pkg/10

175.00

Qty:

21557-10

PELCO^® Silicon Nitride Coated Discs with hydrophobic coating, Ø3mm

pkg/10

175.00

Qty:

21558-10

PELCO^® Silicon Discs, Ø3mm, No Coating

vial/10

115.00

Qty:

PELCO^® Liquid Cell™ Application

Liquid cells have been in use for special microscopy and X-ray analysis techniques and can be used for SEM imaging of liquids, pastes, greases and cells grown on silicon nitride membranes. The material can be applied in the "well" of a Silicon Nitride Membrane Disk or cells can be grown in the well (inside of Silicon Nitride window). To visualize the specimen in the SEM through the membrane the back has to be completely vacuum compatible sealed using the 3mm disk. A second Silicon Nitride membrane can also be used, but the 3mm disk is a more cost effective, sturdier and will keep the liquid better positioned in the "well". Sealing can be done with either a fast curing epoxy glue or M-Bond® 610 #16039. Make sure the complete Liquid Cell is sealed. To achieve optimum conductivity it is advisable to apply carbon paint on the sides to make a conductive bridge from the Silicon Nitride Membrane disk to the blank. The thin membrane of only 50nm has a low absorbance when using backscatter imaging or EDS in the SEM. The achievable results are similar or better compared to using a polymer type of membrane.

PELCO^®CLEM Silicon Support Grids with Apertures


1 x 1mm	0.75 x 0.75mm	0.5 x 0.5mm	0.25 x 0.25mm	0.5 x 1.5mm	0.1 x 1.5mm	0.1 x 0.1mm

The edges of these silicon frames are specially truncated with two parallel flats, which act as an aid for specimen alignment in Correlative Light & Electron Microscopy (CLEM) experiments. These CLEM grids without a silicon nitride membrane are available in a variety of different size apertures and patterns. The CLEM grids are 200µm thick and 3 mm in diameter with two 1 mm-long parallel flat edges on both sides. The grids have a 50nm silicon nitride layer on the back side with bare silicon on the front side. Use of the parallel flats on both sides of the CLEM grid allows the orientation and alignment of the sample to be maintained when using different imaging techniques.

21540CL-10

PELCO^® CLEM Silicon Support Grids with Apertures 0.5 x 0.5mm (no support film)

pkg/10

$125.00

Qty:

21541CL-10

PELCO^® CLEM Silicon Support Grids with Apertures 1.0 x 1.0mm (no support film)