208HR High Resolution Sputter Coater

The 208HR High Resolution Sputter Coater from Cressington offers real solutions to the problems encountered when coating difficult samples for FESEM imaging. FESEM applications need extremely thin, fine-grained, uniform coatings to eliminate charging and to improve contrast on low density materials. In order to minimize the effects of grain size, the 208HR offers a full range of coating materials and gives unprecedented control over thickness and deposition conditions. The 208HR Turbo Pumped High Vacuum System offers a wide range of operating pressures allowing precise control of both uniformity and conformity of the coating, minimizing charging effects.

The 208HR High Resolution Sputter Coater is a complete coating solution, including as standard:

• Pumping system with turbo molecular drag pump, backing pump for turbo, and vacuum connections
• MTM-20 High Resolution Film Thickness Controller
• Rotary-Planetary-Tilting Stage with sample holder selection (4)
• Target selection, Ir or Pt/Pd & Cr, other targets substituted by request

MTM-20 High Resolution Thickness Controller		Rotary-Planetary-Tilting RPT Stage demonstrating variable speed settings and adjustable tilt.

Main Features:

• Wide choice of Coating Materials. Magnetron head design and effective gas handling allow a wide choice of target materials .
• Economical options. Upgraded 208HR-28 offers a smaller diameter target and modified chamber configurations to give the same coating capabilities, but with for more economical usage for costly materials like iridium. 
• Precision Thickness Control. Thickness optimized for FESEM application using the MTM-20 High Resolution Thickness Controller, which has a resolution of 0.1nm. This enables precise and reproducible thin coatings, especially in the range of 0.5 - 3nm, a thickness desirable for FESEM applications.
• Multi-angle Stage Movements. Separate rotary, planetary and tilting stage movements ensure uniform coating with excellent conformity, even on highly topographic samples. Four sample holders are provided with options to accommodate sample sizes as large as 32mm diameter.
• Variable Chamber Geometry. Chamber geometry is used to adjust deposition rate to optimize structure. Height can be adjusted by the addition of metal spacer rings (2 included).
• Wide Range of Operating Pressures. Independent power and pressure adjustment allows operation at argon gas pressure range of 0.1 - 0.005 mbar.
• Compact, Modern, Benchtop Design. Space and energy saving design eliminates need for floor space, water or specialized electrical connections. Integrated turbo molecular drag pump ensures fast pump down combined with high positive pumping speed during sputtering process.

208HR Target Configurations

The 208HR is available in a number of configurations to deliver the best high resolution coatings for your applications. This system is available with two different sputter head designs. The base system is the 208HR-57 #8000, which utilizes a standard 57mm diameter target (Pt/Pd & Cr targets included) and has a Pfeiffer DUO 3.0 rotary-vane backing pump for the turbo. A dry scroll backing pump is also an option on this system (#8004). The 208HR-28 #8008-28 is an upgraded version of the 208HR-57 offering a smaller 28mm diameter target with higher efficiency to better utilize more expensive materials like iridium. This version has a diaphragm backing pump for the turbo included as standard.

57mm Diameter Target			28mm Diameter Target

Preferred Coating Materials for FESEM Applications:

• Ir: Excellent, very fine grain coating material
• Pt/Pd: General-purpose high resolution coating material for non-conducting specimens
• Cr: Excellent for semiconductor materials and high resolution back scattered electron imaging
  

Targets available:  Ø57mm / Ø28mm

208HR Chamber

The 208HR has a modular chamber that consists of glass chamber, metal spacer rings (2 included), and rotary-planetary-tilting stage. These components are labeled in the image below.

208HR Chamber as shown on 208HR-28

The sputter head support pillar can be adjusted into three different positions, varying the overall chamber height. Each adjustment location corresponds to a different metal spacer/ glass chamber / rotary-planetary-tilting RPT stage configuration. The addition of a spacer ring above the RPT stage increases the deposition distances by 15mm (height of metal spacer ring). Two metal spacers are included with the 208HR, but a third (#8091-1) can be purchased separately.

 

Support pillar adjustment locations

Also available is an optional stationary stage with tall 150mm chamber and additional spacer ring (#7021-208HR).

Specifications for the 208HR High Resolution Sputter Coater

USA / Canada: Telephone: 530-243-2200; 800-237-3526; Fax 530-243-3761; Email: [email protected]
International: Telephone: 530-243-2200; Fax 530-243-3761; Email: [email protected]
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