Calibration Overview
UHV-EL Reference Elements

Nickel / Chromium FIB and Ion Beam Sputter Standards

FIB, Focus Ion Beam Sputter Standards

Ion Sputter Standards manufactured to the highest precision for calibrating the sputtering rate of sputter ion guns. Thin films of Nickel/Chromium (Ni/Cr) are available, to calibrate sputtering rate.

Consisting of 12 alternating layers: 6 layers of Cr (~53nm) and 6 layers of Ni (~64nm) for a total thickness of ~700nm with a maximum variation across the 75mm production wafer of ±2%. Standard is on a 10 x 30mm section of a polished silicon wafer. The mass density of Cr and Ni was measured using electron beam excitation and measuring characteristic X-ray intensities.

Prod # Description Unit Price Order / Quote
612-40 Nickel / Chromium Ion Sputter Calibration Standard, Ni / Cr (12 layers) on 10 x 30mm Si each P.O.R.