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PELCO® Silicon Nitride Support Films for TEM

Clean, debris free with Exact 3mm TEM Frame and EasyGrip™ Edges

Si Nitride Support Films
PELCO® Silicon Nitride
Support Films for TEM
Hydrophobic/Hydrophilic Support Films
Hydrophobic/Hydrophilic
SiN Support Films
Holey Silicon Nitride Support Films
PELCO® Holey Silicon Nitride Support Films for TEM
 Silicon Dioxide Support Films for TEM
PELCO® Silicon Dioxide Support Films for TEM
Silicon Aperture Frames (without support films)
Silicon Aperture Frames
(without support films)
Silicon Nitride Coated 3mm Disks (blanks)
Silicon Nitride Coated
and Si 3mm Discs

PELCO® Silicon Nitride Support Films for TEM

8, 15, 35, 50, and 200nm membrane thickness
NEW:
Assortment Pack with various membranes
Silicon Nitride Support Film
Tomography Type SiN Support Film
The PELCO® Silicon Nitride Support Films for TEM (also called Si3N4 TEM membranes) have been developed as an addition to our extensive range of TEM support films to further enable nanotechnology applications and extend molecular biology research. These superior products are made by state-of-the-art semiconductor and patented MEMS fabrication techniques using resilient, low-stress inorganic silicon nitride thin films supported by a sturdy silicon frame. PELCO® Silicon Nitride Support Films are available in four window sizes combined with either 8, 15, 35, 50nm, or 200nm thin membrane thickness on an EM industry standard 3mm diameter round frame, making them the most desirable and useful silicon nitride support films in the current marketplace. Go to Product Overview and Manufacturing Details for more information

Silicon Nitride Support Films have the advantages of being chemically and mechanically robust and can withstand temperature changes up to 1000°C. They are extremely stable and suitable to conduct a variety of nanotechnology experiments with particles or cells mounted directly on the support films.

The PELCO® Silicon Nitride Support Films are indispensable tools for virtually all fields of nanotechnology research. They enable direct deposition and in situ observations of dynamic reactions over a wide temperature range. The support film can be used as a passive support film but can also play a role as an active participant in experiments.

Hydrophobic and Hydrophilic Substrates have been added for nanotechnology and biotechnology applications. The ultra-low-stress 15nm, 50nm, and 200nm membranes have been Atomic Layer-Deposited (ALD) to create these surfaces: go to Hydrophobic / Hydrophilic support films.


Iron nanoparticles dispersed on a Silicon Nitride Support Film

 

Reference to the use of SiN membranes for research on Nanowires
[see p.838 of the article]

Product Overview and Manufacturing Details

Product Overview of Ultra-Thin 8 and 35nm Membranes

 

Iron nanoparticles dispersed on a SiN support film and oxidized at 350°C while supported on the PELCO® SiN support films. The image shows the product of the oxidization process: hollow iron oxide nanoparticles.
Haitao Liu, Dept. of Chemistry, UC Berkeley, California.


PELCO® Silicon Nitride Support Films are manufactured using state-of-the-art semiconductor and MEMS manufacturing techniques. The Silicon Nitride Support Film is grown on a silicon wafer to the desired membrane thickness of 8, 15, 35, 50, or 200nm. The specimen viewing area is created by etching away a window in the silicon substrate, leaving a perfectly smooth, resilient and chemically robust silicon nitride film. The frame is manufactured as a 3mm silicon disc with smooth EasyGrip™ edges for easy manipulation by tweezers and will fit perfectly in standard TEM holders. Standard thickness of the silicon frame is 200µm which will fit most TEM holders. A special version with a 50µm thickness and a 0.25 x 0.25mm window is available for special TEM holders which only accommodate thinner supports. Easy handling capabilities and smoothness of the edges are design advantages over other brands of silicon nitride support films. The PELCO® Silicon Nitride Support Films are manufactured like grids and are completely free from debris particles. The mechanical and chemical stability allow for cleaning of the Silicon Nitride Support Films with chemicals (solvents, acids and bases), glow discharge and plasma cleaning. It is recommended that ultrasonic cleaning not be used, as it can easily shatter the Silicon Nitride Support Films.


Silicon Nitride 50nm Monte Carlo simulations Silicon Nitride 100nm Monte Carlo simulations
Monte Carlo simulations showing less absorption and less scattering in 50nm Silicon Nitride Support Films; Advantage - PELCO®50nm film thickness gives superior imaging and analysis results.


Advantages of the PELCO® Silicon Nitride Support Films
  • Resilient, ultra-low-stress 8, 15, 35 or 50nm Silicon Nitride Support Film
    • The relatively sturdy Silicon Nitride Support Film allows direct deposition of materials and/or manipulation of specimens
    • Largest viewing area for 50nm film thickness
    • 8 and 15nm film thickness without pinholes for ultra high resolution TEM applications

  • Robust, low-stress 200nm Silicon Nitride Support Film
    • Stronger membrane for multiple handling

  • Special window for TEM tomography applications
    • Large (0.5x1.5mm) windows designed primarily for high-tilt tomography applications allowing up to 75° tilt

  • Multiple window version
    • 2 separate 0.1 x 1.5mm windows on one single frame
    • 3x3 array gives 9 separate 0.1 x 0.1mm windows on one single frame
    • 25 apertures on a 0.5x0.5mm window, ideal for multiple samples

  • Multiple microscopy techniques capability
    • The mechanical stability allows for multiple microscopy techniques like TEM, SEM, EDX, XPS and AFM on the same silicon nitride support film.

  • Films are resistant to solvents, acids and bases
    • Specimen can be studied, synthesized or manipulated under acidic or basic conditions

  • Silicon Nitride Support Films are ideal for high temperature experiments
    • Films withstand temperatures up to 1000°C

  • The PELCO® Silicon Nitride Support Films provide more accurate analysis of specimens containing carbon, and reduce contamination
    • Carbon-free background for TEM imaging and analysis

  • Films can be easily cleaned
    • The mechanical and chemical stability allow the Silicon Nitride Support Films to be easily cleaned using glow discharge of plasma cleaning techniques

  • Ultra-flat background support film
    • Ideal substrate for deposition of nanoparticles and thin films
    • Perfect for SEM imaging due to the absence of background structure

  • Clean manufacturing avoids debris particles on support films
    • The PELCO® Silicon Nitride Support Films have no broken edges and are free from debris. Furthermore they are packaged under class 100 (US Fed Standard 209E) clean room conditions

  • Frame thickness of 200 and 50µm
    • 200µm for standard TEM grid holders
    • 50µm for special TEM grid holders

  • Industry standard 3mm diameter round frame
    • Fits exactly in standard TEM holders and provides EasyGrip™ edges for handling. Also provides a more sturdy silicon frame.

  • All PELCO® Silicon Nitride Support Films from the same batch have identical properties
    • Ideal for large series of comparison studies

  • Also available with Hydrophilic/Hydrophobic modified surfaces and as Holey Membranes.
EasyGrip single window
single window or multiple windows
EasyGrip multiple windows
9 ea. 0.1 x 0.1mm apertures

2 ea. 0.1 x 1.5mm Apertures
Ultrathin 8nm
Ultra Thin 8nm

EasyGrip Edge MicrographSilicon Nitride Support Film with EasyGrip Edge
EasyGrip™ Edge

Applications Fields:

  • Cell biology: attached cells can be grown in their environment on the support film and subsequently analyzed
  • Analysis of colloids, aerosols, nanoparticles
  • Self-assembled mono-layers
  • Polymer research
  • Thin film research (directly deposited on the Silicon Nitride Support Film)
  • Materials science
  • Properties of nano-structures for semiconductor devices
  • Semiconductor: characterization of thin films
  • Catalyst development
Single slice electron tomogram of a single synapse
a
synaptic vesicles and microtubules can be clearly discerned
b
Three-dimensional model of the tomographic data
c

(a) (b) Single slice electron tomogram of a single synapse in (a) where synaptic vesicles and microtubules can be clearly discerned. (c) Three-dimensional model of the tomographic data in (b) created by the use of the IMOD suite of programs. Prof. M. Stowell, et. al., MCDB, CU-Boulder, Colorado.

Product Description
Defining parameters for the PELCO® Silicon Nitride Support Films are:

  • Film Thickness: Resilient, ultra-low-stress 8, 15, 35 or 50nm giving rise to minimum absorption to enable clear imaging; robust, low stress 200nm for better handling and use on multiple platforms;
  • Window Sizes: 0.25x0.25mm, 0.5x0.5mm, 0.75x0.75mm, 1.0x1.0mm, 0.5x1.5mm and multiple window versions with 9 windows of 0.1x0.1mm in a 3x3 array or 2 windows of 0.1x1.5mm. Larger windows give a greater viewing area and for example, allow for the higher tilt angles required for tomography applications. The versions with the multiple windows allows for mounting multiple samples on separate windows;
  • Window/Aperture Size for Ultra-Thin, 8nm Film: Window size is 0.5 x 0.5mm with 25 apertures of 60 x 60µm on a 200nm silicon nitride support mesh. Bar width 35µm, edge 30µm (go to Manufacturing Details).
  • Window/Aperture Size for Resilient 35nm Film: Window size is 0.5x0.5mm with 25 apertures of 70x70µm on a 200nm support mesh. Bar width 25µm, edge 25µm (go to Manufacturing Details).
  • Frame Thickness: Silicon support structure is 200µm standard. This allows for fitting in all standard TEM holders and gives a sturdy support frame. 50µm is also available for special TEM holders.
  • Surface Roughness: The RMS (Rq) is 0.65 +/- 0.06nm which gives a mean roughness (Ra) of 0.45 +/- 0.02nm;
  • Frame Diameter: EM standard 3mm diameter disc, fully compatible with TEM holders and with EasyGrip™ edges for improved handling;
  • Packaging: The PELCO® Silicon Nitride Support Films are packaged under cleanroom conditions in the PELCO® #160 TEM Grid Storage Box. Each box holds 10 support films.

MSDS (PDF - 367KB)

Made in USA

Prod # Description Unit Price Order / Quote
8nm membrane thickness / 25 apertures / 200µm frame thickness
21510-10 Silicon Nitride Support Film, 8nm, 60x60µm Apertures (25) on 0.5x0.5mm Window pkg/10 $385.00
Qty:
15nm membrane thickness / 200µm frame thickness
21560-10 Silicon Nitride Support Film, 15nm with 0.25x0.25mm Window pkg/10 245.00
Qty:
21569-10 Silicon Nitride Support Film, 15nm with 9 each 0.1x0.1mm Windows pkg/10 245.00
Qty:
35nm membrane thickness / 25 apertures / 200µm frame thickness
21515-10 Silicon Nitride Support Film, 35nm, 70x70µm aperture (25) on 0.5x0.5mm Window pkg/10 198.00
Qty:
50nm membrane thickness / 200µm frame thickness
21505-10 Silicon Nitride Support Film, 50nm with 0.25x0.25mm Window pkg/10 165.00
Qty:
21505-100 Silicon Nitride Support Film, 50nm with 0.25x0.25mm Window pkg/100 1575.00
Qty:
21500-10 Silicon Nitride Support Film, 50nm with 0.5x0.5mm Window pkg/10 165.00
Qty:
21500-100 Silicon Nitride Support Film, 50nm with 0.5x0.5mm Window pkg/100 1575.00
Qty:
21501-10 Silicon Nitride Support Film, 50nm with 0.75x0.75mm Window pkg/10 168.00
Qty:
21501-100 Silicon Nitride Support Film, 50nm with 0.75x0.75mm Window pkg/100 1590.00
Qty:
21502-10 Silicon Nitride Support Film, 50nm with 1.0x1.0mm Window pkg/10 168.00
Qty:
21502-100 Silicon Nitride Support Film, 50nm with 1.0x1.0mm Window pkg/100 1590.00
Qty:
21504-10 Silicon Nitride Support Film, 50nm with 0.5x1.5mm Window pkg/10 168.00
Qty:
21504-100 Silicon Nitride Support Film, 50nm with 0.5x1.5mm Window pkg/100 1590.00
Qty:
21508-10 Silicon Nitride Support Film, 50nm with 2 each 0.1x1.5mm Windows pkg/10 168.00
Qty:
21509-10 Silicon Nitride Support Film, 50nm with 9 each 0.1x0.1mm Windows pkg/10 168.00
Qty:
200nm membrane thickness / 200µm frame thickness
21525-10 Silicon Nitride Support Film, 200nm with 0.25x0.25mm Window pkg/10 125.00
Qty:
21525-100 Silicon Nitride Support Film, 200nm with 0.25x0.25mm Window pkg/100 1200.00
Qty:
21520-10 Silicon Nitride Support Film, 200nm with 0.5x0.5mm Window pkg/10 125.00
Qty:
21520-100 Silicon Nitride Support Film, 200nm with 0.5x0.5mm Window pkg/100 1200.00
Qty:
21521-10 Silicon Nitride Support Film, 200nm with 0.75x0.75mm Window pkg/10 125.00
Qty:
21521-100 Silicon Nitride Support Film, 200nm with 0.75x0.75mm Window pkg/100 1200.00
Qty:
21522-10 Silicon Nitride Support Film, 200nm with 1.0x1.0mm Window pkg/10 130.00
Qty:
21522-100 Silicon Nitride Support Film, 200nm with 1.0x1.0mm Window pkg/100 1250.00
Qty:
21524-10 Silicon Nitride Support Film, 200nm with 0.5x1.5mm Window pkg/10 135.00
Qty:
21524-100 Silicon Nitride Support Film, 200nm with 0.5x1.5mm Window pkg/100 1275.00
Qty:
21528-10 Silicon Nitride Support Film, 200nm with 2 each 0.1x1.5mm Windows pkg/10 125.00
Qty:
21529-10 Silicon Nitride Support Film, 200nm with 9 each 0.1x0.1mm Windows pkg/10 125.00
Qty:
50nm membrane thickness / 50µm frame thickness
21570-10 Silicon Nitride Support Film, 50nm on 50µm frame thickness with 0.25x0.25mm Window pkg/10 285.00
Qty:
21578-10 Silicon Nitride Support Film, 50nm on 50µm frame thickness with 2 each 0.1x1.5mm Windows pkg/10 285.00
Qty:
21579-10 Silicon Nitride Support Film, 50nm on 50µm frame thickness with 9 each 0.1x0.1mm Windows pkg/10 285.00
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The Silicon Nitride Assortment Pack

with various membrane thicknesses and sizes

The Silicon Nitride Assortment Pack is the ideal way to determine which membrane thickness or size of silicon nitride or silicon dioxide is the optimum product for your application. The assortment pack includes the following thickness and window sizes on 200um thick silicon frames:

Position
In Grid Box
Unit Membrane Type
1A 1 ea Si3N4 15nm membrane with 0.25x0.25mm window
1B 1 ea 1 ea Si3N4 15nm membrane with 0.25x0.25mm window
1C 1 ea 1 ea Si3N4 50nm membrane with 0.25x0.25mm window
1D 1 ea 1 ea Si3N4 50nm membrane with 9 ea 0.1x0.1mm windows
1E 1 ea Si3N4 50nm membrane with 0.5x0.5mm window
2A 1 ea Si3N4 50nm membrane with 0.75x0.75mm window
2B 1 ea Si3N4 200nm membrane with 0.25x0.25mm window
2C 1 ea Si3N4 200nm membrane with 0.5x0.5mm window
2D 1 ea SiO2 40nm membrane with 0.5x0.5mm window
2E 1 ea Holey Si3N4 200nm membrane with 2.5µm holes with 0.5x0.5mm window
Made in USA

Prod # Description Unit Price Order / Quote
21597-10 Silicon Nitride Assortment Pack (10 different membranes) each $195.00
Qty:




Hydrophobic and Hydrophilic Silicon Nitride Membrane

Silicon Nitride membranes have been modified using Atomic Layer-Deposited (ALD) techniques to change their surface properties. Depending on the process used, both Hydrophilic and Hydrophobic substrates have been created with the following advantages:

  • Choice between low and high surface energies
  • Smooth and conformal substrates
  • Enhanced wetting and biocompatibility (hydrophilic)
  • No need for plasma treatment of surface prior to cell growth
  • Hydrophobic coating offers novel platform for deposition and growth of nanomaterials
Hydrophobic surfaces improve sample preparation for materials that are dissolved or suspended in organics solvents. Nanoparticles in organic solvents (such as carbon nanotubes) will readily disperse on the Silicon Nitride membrane surface.
Hydrophilic surfaces enhance wetting and dispersion of aqueous solutions. This avoids particle aggregation effects commonly observed on less hydrophilic surfaces. Particularly useful in water based sols and life science applications.
Both coatings are available on 50nm and 200nm Silicon Nitride Membranes with a 0.5 x 0.5mm window and 15nm Si3N4 membrane with 9 each 0.1x0.1nm windows on a 200µm silicon frame with a diameter of 3mm, compatible with all standard TEM grid holders. Both sides of the membrane and frame are coated. We advise to handle the discs by gripping at the edge.

Specifications:

  • Hydrophilic: 2.5nm atomic layer-deposited hydroxylated alumina on 15, 50 and 200nm ultra-low-stress silicon nitride membrane
  • Hydrophobic: 2.5nm atomic layer-deposited alumina and fluoro-methyl-silane on 15, 50 and 200nm ultra-low-stress silicon nitride membrane
  • Surface Energy:
Surface Surface Energy (mJ/m2) Standard Deviation
Silicon Nitride Membrane 46.1 4.3
Hydrophilic Coating 76.1 2.2
Hydrophobic Coating 24.6 4.4
mj= millijoules
  • Surface Roughness:
Surface Surface Roughness (nm) Standard Deviation
Silicon Nitride Membrane Rq=0.65
Ra=0.45
0.06
0.02
Hydrophilic Coating Rq=0.57
Ra=0.40
0.04
0.03
Hydrophobic Coating Rq=0.66
Ra=0.40
0.03
0.05
Rq= Surface Roughness; Ra= Roughness Average
  • Film Thickness: Resilient, low stress 15, 50 and 200nm, giving rise to minimum absorption to enable clear imaging
  • Window Sizes: Array of 9 ea. 0.1 x 0.1mm and 0.5x0.5mm
  • Frame Thickness: Silicon support structure is 200µm standard.
  • Frame Diameter: EM standard 3mm diameter disc, fully compatible with standard TEM holders (no broken edges)
  • EasyGrip™ Edges for easy handling with tweezers
  • Packaging: The PELCO® Silicon Nitride Support Films are packaged under cleanroom conditions in the PELCO® #160 TEM Grid Storage box. Each box holds 10 support films.

MSDS 21550-10 (PDF - 160KB)
MSDS 21552-10 (PDF - 165KB)

Made in USA

Prod # Description Unit Price Order / Quote
21553-10 PELCO® Hydrophilic 15nm Silicon Nitride Membrane, 9 ea. 0.1x0.1mm Windows pkg/10 $335.00
Qty:
21550-10 PELCO® Hydrophilic 50nm Silicon Nitride Membrane, 0.5x0.5mm Window pkg/10 235.00
Qty:
21551-10 PELCO® Hydrophilic 200nm Silicon Nitride Membrane, 0.5x0.5mm Window pkg/10 205.00
Qty:
21593-10 PELCO® Hydrophobic 15nm Silicon Nitride Membrane, 9 ea. 0.1x0.1mm Windows pkg/10 335.00
Qty:
21552-10 PELCO® Hydrophobic 50nm Silicon Nitride Membrane, 0.5x0.5mm Window pkg/10 235.00
Qty:
21591-10 PELCO® Hydrophobic 200nm Silicon Nitride Membrane, 0.5x0.5mm Window pkg/10 205.00
Qty:
21597-10 Silicon Nitride Assortment Pack (10 different membranes) each 195.00
Qty: