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TEM Grids Overview
PELCO® Silicon Nitride Support Films for TEM
Hydrophobic/Hydrophilic SiN Support Films
PELCO® Silicon Dioxide Support Films for TEM
Silicon Aperture Frames (without support films)
Silicon Nitride Coated 3mm Disks (blanks)

PELCO® Holey Silicon Nitride Support Film for TEM

200nm membrane with holes from 2.5µm down to 100nm

holey grid

Advanced MEMs technologies have been applied to incorporate many improvements into this truly unique next generation holey Silicon Nitride support membrane. Holey membranes or support films are also referred to as perforated or patterned films; there is no film or membrane covering the holes. The platform for this holey Silicon Nitride support film is the low stress 200nm Silicon Nitride support film on a circular 3mm silicon frame with a 0.5 x 0.5mm membrane. The diameter of the holes available is 2.5µm, 1.25µm, 1µm, 750nm, 500nm, 400nm, and 100nm. This design has a number of advantages over previously offered products:

  • Relatively large open area
  • Added resilience of membrane
  • Practical hole size for experiments
  • A boundary of 25µm non-perforated membrane surrounding the holey membrane area
  • TEM standard circular shape
  • EasyGrip™ edge for improved handling

The Silicon Nitride Support Films are resistant to solvents, acids and bases, allowing for dynamic experiments directly on the holey membrane. The Silicon Nitride Support Films allow for high temperature experiments/imaging up to 1000°C. Films can be easily cleaned using glow discharge or plasma cleaning techniques. They also provide a carbon-free background for TEM imaging and analysis. The clean manufacturing techniques avoid the debris particles that are often found on other makes of silicon nitride support films.

silico dioxide grid silico dioxide grid
Holey 200nm Si3N4 support frame on 3mm frame 0.5 x 0.5mm window with Holey Si3N4 membrane imaged from back side.
Product Specifications
Defining parameters for the PELCO® Holey Silicon Nitride Support Films are:
  • Membrane Thickness: 200nm for added resilience
  • Window Size: 0.5 x 0.5mm
  • Hole Sizes and Pitch:
    • 2.5µm circular pores with a 4.5µm pitch and 100 x 100 array
    • 1.25µm circular pores with a 2.2µm pitch and 40 x 40 array
    • 1.0µm circular pores with a 2.0µm pitch and 40 x 40 array
    • 750nm circular pores with a 1.35µm pitch and 50 x 50 array
    • 500nm circular pores with a 1.0µm pitch and 75 x 75 array
    • 400nm circular pores with a 0.53µm pitch and 150 x 150 array
    • 100nm circular pores with a 0.21µm pitch and 375 x 375 array
    • Mixed array pores with 1000nm (12 x 12 array), 750nm (17 x 17 array), 500nm (25 x 25 array), 400nm (31 x 31 array), 350nm (42 x 42 array), 300nm (50 x 50 array), and 200nm (65 x 65 array) for a total of 7 sizes.
  • Pore Diameter: Sizes are within 10% of diameter
  • Pattern: Close packed hexagonal arrangement of 100 x 100 rows/columns with a total of 10,000 holes. A 25um boundary of non-perforated membrane surrounds the perforated area for the 2.5µm pores
  • Perforated Area: 0.45 x 0.45mm for 2.5µm pores
  • Frame Thickness: Silicon support structure is 200µm standard. This allows for fitting in standard TEM holders and gives a sturdy support frame
  • Surface Roughness: The RMS (Rq) is 0.65 +/- 0.06nm which gives a mean roughness (Ra) of 0.45 +/- 0.02nm
  • Frame Diameter: TEM standard 3mm diameter disc, fully compatible with regular TEM holders and with EasyGrip™ edges for improved handling
  • Packaging: The PELCO® Holey Silicon Nitride Support Films are packaged under cleanroom conditions in the PELCO® #160 TEM Grid Storage Box. Each box holds 10 support films

MSDS (PDF - 367KB)

Made in USA

Prod # Description Unit Price Order / Quote
21535-10 PELCO® Holey Silicon Nitride Support Film, 200nm, 2.5µm pores, 0.5 x 0.5mm window, Ø3mm pkg/10 $325.00
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21580-10 PELCO® Holey Silicon Nitride Support Film, 200nm, 1.25µm pores, 0.5 x 0.5mm window, Ø3mm pkg/10 475.00
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21581-10 PELCO® Holey Silicon Nitride Support Film, 200nm, 1.0µm pores, 0.5 x 0.5mm window, Ø3mm pkg/10 475.00
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21582-10 PELCO® Holey Silicon Nitride Support Film, 200nm, 750nm pores, 0.5 x 0.5mm window, Ø3mm pkg/10 475.00
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21583-10 PELCO® Holey Silicon Nitride Support Film, 200nm, 500nm pores, 0.5 x 0.5mm window, Ø3mm pkg/10 475.00
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21584-10 PELCO® Holey Silicon Nitride Support Film, 200nm, 400nm pores, 0.5 x 0.5mm window, Ø3mm pkg/10 475.00
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21585-10 PELCO® Holey Silicon Nitride Support Film, 200nm, 100nm pores, 0.5 x 0.5mm window, Ø3mm pkg/10 475.00
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21589-10 PELCO® Holey Silicon Nitride Support Film, 200nm, mixed pores, 0.5 x 0.5mm window, Ø3mm pkg/10 475.00
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The Silicon Nitride Assortment Pack

with various membrane thicknesses and sizes

The Silicon Nitride Assortment Pack is the ideal way to determine which membrane thickness or size of silicon nitride or silicon dioxide is the optimum product for your application. The assortment pack includes the following thickness and window sizes on 200um thick silicon frames:
1 ea Si3N4 15nm membrane with 0.25x0.25mm window
1 ea Si3N4 15nm membrane with 9 ea 0.1x0.1mm windows
1 ea Si3N4 50nm membrane with 0.25x0.25mm window
1 ea Si3N4 50nm membrane with 9 ea 0.1x0.1mm windows
1 ea Si3N4 50nm membrane with 0.5x0.5mm window
1 ea Si3N4 50nm membrane with 0.75x0.75mm window
1 ea Si3N4 200nm membrane with 0.25x0.25mm window
1 ea Si3N4 200nm membrane with 0.5x0.5mm window
1 ea SiO2 40nm membrane with 0.5x0.5mm window
1 ea Holey Si3N4 200nm membrane with 2.5um holes with 0.5x0.5mm window

Made in USA

Prod # Description Unit Price Order / Quote
21597-10 Silicon Nitride Assortment Pack (10 different membranes) each $195.00
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