1. Advanced 308R Pumping System and Vacuum Chamber
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The 308R system is a unique versatile compact desktop vacuum coating system. It is
packed with new features and the latest vacuum technology to ensure fast and clean
pumping coupled to smooth operation. The advanced wide range turbo pump can be optimized
for either evaporation (E-Beam or thermal) or for sputtering / glow discharge with
a single touch of a button. The truly revolutionary desktop pumping system is fully gauged, features
electronic valves and is microprocessor controlled for automatic pump down and venting
sequences. Precision gas leak for sputter gas and separate dry venting line are standard.
All functions are readily accessible via manual operation for increased flexibility.
A well-maintained system routinely pumps down into the 10-7 mbar range using the
high speed mode of the turbo pump. The 308R is now equipped with a light weight stainless
steel chamber featuring two windows (75 and 100mm) and 2 KF40 flanges. The standard
9-port KF40 feedthrough collar has an internal mounting ring for the deposition sources.
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All connections for the thermal evaporation sources, sputtering heads, E-Beam sources,
glow discharge cleaning head, thickness monitor, shutters and rotary/tilt stages
are on the 9-port feedthrough collar. All power supplies are compact standalone units
positioned aside the pumping station, enabling the user optimum and easy configuration
at any time.
The Cressington 308R Vacuum Chamber is manufactured using annealed stainless steel
for improved vacuum performance. The light weight construction makes it easy to remove
the chamber to access the deposition sources or the substrate.
Advantages of the Cressington 308 Vacuum Pumping System:
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- Vacuum chamber and pumping manifold from annealed stainless steel gives near UHV clean vacuum performance
- Light weight stainless steel chamber with separate dome for improved accessibility and safety
- Fully indexed collar, chamber and dome for easy assembly
- Compact system for both sputter and evaporation operation
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2. EM300 Carbon and Metal Evaporation for EM Applications
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The EM300 power supply has been specifically designed for carbon and metal evaporation as used in electron microscopy applications. Since carbon and metal evaporation use different power ranges the EM300 use has two dedicated outputs and controls: one for carbon evaporation (Head 1) and one for metal evaporation (Head 2). Both outputs are mounted on KF40 feedthroughs on the cables with safety interlock switches on each cable. The EM300 power supply is protected with over-current protection trips. The carbon evaporation controls use a power range of 6V and 150A with the option of manual control of automated control with digital settings for voltage and time. The metal evaporation controls uses 5V and 50A with continuous rating. The choice of power ranges makes the power supply compatible with many available filaments, baskets and boats. The LT300 evaporations sources allows for sources with an overall length of either 1.875 (48mm) or 3” (76mm) and a width of up to 1/2” (12.7mm) |
3. LT300 Metal Evaporation Power supply
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The LT300 metal evaporation power supply has been designed for light thin film metal evaporations
in the 308R coater. It has a dual source output with two KF40 feedthroughs and safety vacuum
interlock switches on each feedthrough. Each output has a selectable voltage output range of
2.5 and 5 volts with 130 and 65A respectively with over-current protection trips. The voltage
range makes this power supply compatible with many available evaporation boats, filaments and
baskets.
The innovative ESH-23 metal source holder can be configured for either 1.875"/48mm or 3"/76mm overall length sources with a width of up to 0.5"/12.7mm. This allows for using a wide variety of readily available sources.
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4. LT1500 High Power Evaporation for Thin Film Analysis Applications
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The LT1500 high power supply has been specifically designed for thin film applications requiring high deposition rates. It comprises a dual source output with two KF40 feedthroughs and safety vacuum interlock switches on each feedthrough. The voltage selection is either 4 or 8 volts with 375A and 190A respectively to accomodate a large variety of materials and evaporation sources. The LT1500 with the larger 3" or 4" water-cooled evaporation source holder uses 75 or 100mm long boats, baskets and mini-crucibles. It has enough power to drive baffle boats. The water cooling feedthroughs are mounted on a standard KF40 flange. LT1500 Power Supply needs either 208 or 230V, 60/50 Hz. |
5. DC100 DC Magnetron Power Supply, Sputter Sources and Glow Discharge Cleaning
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DC Magnetron Head Assembly on Swinging Arm mounted on a standard KF40 feedthrough.
Sputter head with cooling plate and cooling lines for upwards deposition, shutter in front of sputter head
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The DC100 DC magnetron power supply has a dual output on a single KF40 feedthrough
with a safety vacuum interlock integrated in the feedthrough. Up to two compact sputter
sources or a combination of sputter head and glow discharge can be connected to one
DC100 power supply. Sputter sources have a separate feedthrough, and can be positioned
anywhere in the chamber.
The DC100 power supply is adjustable from 5-80 Watts. Operation is either manual, preset current or thickness controlled (needs the high resolution MTM-20 thickness controller). The sputter sources for the 308 use compact 38mm diameter targets. This allows for mounting up to 4 sputter heads in the vacuum chamber to accommodate either sputtering of multiple layers or co-sputtering of materials. Sputter sources can be conditioned or shielded by using shutter assemblies. The advanced vacuum system and precise leak valve setting gives excellent control over the argon sputter gas pressure resulting in a wide range of sputter rates.
The efficient glow discharge head used together with air as process gas gives excellent
plasma/ion cleaning of substrates, TEM grids. With the glow discharge hydro carbons
or biological material can also be etched.
For materials with a low sputter rate, such as Al, a water cooling kit for the DC Magnetron
sputter head is available. The #9520-10 water cooling kit includes cooling plate
(to fit on #9520 sputter head) metal flexibles and KF40 feed
through. Not available for a sputter head on swingline arm.
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6. EB500 Electron Beam Evaporation and EB Sources
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The EB500 power supply is a high performance single output E-beam power supply capable
of driving the Cressington electron beam sources for carbon and platinum/carbon.
The EH53 carbon source is a directional rod-fed E-beam source designed to produce
ultra-high resolution and ultra-thin carbon films for ultrastructural TEM applications.
It can also be used for FESEM sample coating and demanding EBSD applications.
The EH52 Pt/C E-beam source is also a directional rod-fed electron beam evaporation
source specifically designed for low angle rotary shadowing work for high resolution
TEM applications.
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Both E-Beam carbon sources are also used in the highly acclaimed Cressington Freeze
Fracture and Freeze Etching systems and are renowned for delivering consistent ultra-
high resolution coatings in EM applications.
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7. Substrate Stages
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Feedthrough Collar with Rotary-Planetary-Tilting Stage
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Feedthrough Collar with Rotary-Tilting Stage
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There is a choice of substrate stages:
- A simple static table mounted in the center of the source mounting ring
- A rotary-tilting (RT) stage with variable speed, having a choice of 4" or 8" stages
- An advanced rotary-planetary-tilting (RPT) stage with 4 sample holders
Both the RT and RPT stage use one KF40 flange for mounting. Standard configuration
is for downward deposition, but upwards evaporation is available by mounting the
RT or RPT stage in the top of the lightweight stainless steel vacuum chamber.
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8. Shutters
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The manual shutters can be used either for shielding the specimen or a source. Mounted
on a standard KF40 feedthrough they can be positioned and moved through a control
knob. The shutter blade can be easily repositioned on the shutter holder for optimum
shielding and to adjust for different configurations. For specific applications a
sputter source can be shielded with a stationary shutter mounted on the mounting
ring.
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9. Precise MTM Film Thickness Measurement Systems
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MTM-10 Thickness Monitor for use with the 308R-EM Vacuum Coating System
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Each 308R is supplied with a precise high resolution MTM-10 thickness measurement system utilizing a 6Mhz quartz crystal. Using a thickness monitor is the only reliable method for controlling the coating thickness and to achieve consistent coating thickness. The MTM-10 can store four density and tooling factors and has a resolution of 0.1nm for a density of 2 g/cm3 (carbon). Optionally available is the MTM-20 thickness controller, which has an integrated termination facility for the DC100 sputter power supply. When using evaporation processes the MTM-20 is used as a thickness monitor system. |
| Prod # | Description | Unit | Price | Order / Quote |
| 308UHR Ultra High Resolution Coating System for RESEM and TEM |
| 308UHR Ultra High Resolution Coating System for FESEM and TEM, 115V, 60Hz | | |
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| 308UHR Ultra High Resolution Coating System for FESEM and TEM, 220V, 50/60Hz | | |
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| 308R-EM Evaporation and Sputter Coating System |
| 308R-EM Evaporation and Sputter Coating System for EM, 115V, 60Hz | | |
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| 308R-EM Evaporation and Sputter Coating System for EM, 220V, 50/60Hz | | |
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| 308R Dual Source Sputtering System |
| 308R Dual Source Sputtering System, 115V, 60Hz | | |
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| 308R Dual Source Sputtering System, 220V, 50/60Hz | | |
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| 308R Dual Source Termal Evaporation System |
| 308R Dual Source Thermal Evaporation System, 115V, 60Hz | | |
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| 308R - Dual Source Thermal Evaporation System, 220V, 50/60Hz | | |
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| 308R Multi Coater for Evaporation and Sputtering System |
| 308R Multi Coater for Evaporation and Sputtering System, 115V, 60Hz | | |
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| 308R Multi Coater for Evaporation and Sputtering System, 220V, 50/60Hz | | |
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| 308R Thin Film High Power Evaporation System |
| 308R Thin Film High Power Evaporation System, 115V, 60Hz | | |
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| 308R Thin Film High Power Evaporation System, 220V, 50/60Hz | | |
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| Prod # | Description | Unit | Price | Order / Quote |
| 12" Feedthrough Collar, 100mm, 9xQF40 ports, includes QF40 Blanking Plate, O-rings and Clamps | | |
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| O-Ring Collar, Cyl. Base and top plate, New Style Stacked | | |
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| O-Ring f Cylinder Top (old style) | | |
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| 12 x 8" Light Weight Stainless Steel Vacuum Chamber, includes 3xQF40 ports, 75 and 100mm windows | | |
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| O-Ring and gasket f 75mm Window Port | | |
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| O-Ring f 100mm Window Port | | |
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| Gasket for ø100mm Window Clamp Ring | | |
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| Replacement Window ø75mm | | |
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| Replacement Window ø100mm | | |
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| 12" Domed Stainless Steel Top Plate with window | | |
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| 12" Domed Stainless Steel Top Plate with 2000 L/sec Cryo-pump with Isolation Valve | | |
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| Domed Top Plate with port | | |
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| Blanking Plate | | |
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| Blanking Plate with 100mm window | | |
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| Cryo Pump with Isolation Valve | | |
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| Prod # | Description | Unit | Price | Order / Quote |
| EM300, Dual Output Evaporation Supply, max. 175A/4V with two QF40 feedthroughs and pressure switch control, 115V | | |
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| EM300, Dual Output Evaporation Supply, max. 175A/4V with two QF40 feedthroughs and pressure switch control, 220V | | |
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| 308 Bradley Carbon Evaporation Assembly | | |
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| ESH-2 Metal Evaporation Assembly for 1.875" long sources | | |
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| ESH-23 Metall evaporation source assembly for either 1.875" or 3" long sources | | |
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| Manual Shutter Assembly on QF40 feedthrough | | |
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| Prod # | Description | Unit | Price | Order / Quote |
| LT1500, Dual Output Evaporation Supply, max. 375A/4V with two QF40 feedthroughs and pressure switch control, 220V | | |
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| Single ESH-4C Evaporation Source 100mm, water cooled | | |
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| Dual ESH-4C Evaporation Source 100mm, water cooled | | |
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| Single ESH-3C Evaporation Source, 75mm, water cooled | | |
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| Dual ESH-3C Evaporation Source, 75mm, water cooled | | |
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| Manual Shutter Assembly on QF40 feedthrough | | |
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| Source Mounting Ring with 36 holes for 9510 | | |
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| Prod # | Description | Unit | Price | Order / Quote |
| DC100 Dual Output Sputter Supply with single QF40 dual feedthrough and pressure switch control, 115V | | |
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| DC100 Dual Output Sputter Supply with single QF40 dual feedthrough and pressure switch control, 220V | | |
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| DC Magnetron Sputter Head Assembly, 38mm disc target size | | |
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| Water Cooling Kit for #9520 sputter head, incl. cooling disc, metal flexibles and KF40 feedthrough (not compatible with #9520-20) | | |
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| DC Magnetron Head Assembly on Swinging Arm, 38mm disc target size (swinging control on QF40 feedthrough) | | |
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| Glow Discharge Assembly for TEM grid cleaning | | |
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| Glow Discharge Assembly on Swinging Arm (swinging control on QF-40 feedthrough) | | |
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| Manual Shutter Assembly on QF40 feedthrough | | |
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| Static Shutter Kit | | |
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| Source Mounting Ring with 36 holes for 9510 | | |
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| Prod # | Description | Unit | Price | Order / Quote |
| Consumables and Accessories for 308R Systems |
| Replacement Crystals for MTM-10/20 | | |
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| Pointed Carbon Rods, Double Neck Tip 6.2x38mm (1/4"x1-1/2"), 60Hz | | |
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| Pointed Carbon Rods, Double Neck Tip 6.2x38mm (1/4"x1-1/2"), 50Hz | | |
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| Two Step Carbon Rod Sharpener for 1/4" rods (Cressington 108C & 208C) | | |
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| Replacement Blades for Two Step Carbon Rod Sharpener for 1/4" rods | | |
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| Carbon Rod Slider Springs for Bradley Carbon Source | | |
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| Carbon Rod Slider, replacement or spare | | |
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| Copper Braids for Bradley Carbon Source | | |
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| Ceramic Insulators for Bradley Carbon Source | | |
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| Replacement Bradley Carbon Source for 108C and 208C | | |
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| Tungsten Filament, 6 Coils | | |
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| Tungsten Wire Basket, 3-strand | | |
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| Oil Mist Filter for 7010 pump | | |
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| Pfeiffer P3 Oil for #7010 Pump | | |
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| O-ring for collar and chamber cylinder base | | |
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| O-ring for chamber cylinder | | |
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| O-ring for 75mm window | | |
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| O-ring for 100mm window | | |
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| Prod # | Description | Unit | Price | Order / Quote |
| Consumables and Accessories for E-Beam Systems and CFE 50/60 |
| EH52 E-Beam Shadowing Source, uses 2mm rods | | |
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| EH52 E-Beam Shadowing Source, uses 3mm rods | | |
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| HT Cable 29cm for E-Beam Source | | |
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| HT Cable 38cm for E-Beam Source | | |
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| Ceramics for EB Emitter EH52 and EH53 | | |
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| Tungsten E-Beam Emitter Filaments for both EH52 / EH53 | | |
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| Pt/C Rods, 2mm for EH52 E-Beam Source | | |
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| Carbon Rods, 3mm for EH53 E-Beam Source | | |
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| W/Ta Rods for CFE 50/60 | | |
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| Pt/C Rods, 3mm for EH 53 E-Beam Source | | |
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| Microtome Blade Carrier CFE 50/60 | | |
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| Microtome Blades CFE 50/60 | | |
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| Prod # | Description | Unit | Price | Order / Quote |
| Aluminum Target, 99.999% Al (38 x 0.1mm) | | |
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| Chromium Target, 99.99% Cr (38 x 3.2mm) | | |
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| Cobalt Target, 99.99% Co (38 x 0.1mm) | | |
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| Copper Target, 99.99% Cu (38 x 0.1mm) | | |
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| Gold Target, 99.99% Au (38 x 0.2mm) | | |
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| Gold Target, 99.99% Au (38 x 0.4mm) | | |
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| Gold/Palladium Target, 99.99% Au:Pd, 60:40 ratio, (38 x 0.2mm) | | |
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| Gold/Palladium Target, 99.99% Au:Pd, 60:40 ratio, (38 x 0.4mm) | | |
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| Indium Tin Oxide Target, 99.99% ITO, IN2O3/SNO2 90/10 wt % (38 x 3mm) | | |
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| Iridium Target, 99.99% Ir, (38 x 0.3mm) | | |
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| Iron Target, 99.95% Fe, (38 x 0.5mm) | | |
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| Lead Target, 99.99% Pb, (38 x 0.2mm) | | |
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| Molybdenum Target, 99.98% Mo (38 x 3.2mm) | | |
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| Nickel Target, 99.98% Ni, (38 x 0.5mm) | | |
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| Niobium Target, 99.95% Nb, (38 x 0.5mm) | | |
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| Palladium Target, 99.99% Pd, (38 x 0.2mm) | | |
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| Platinum Target, 99.95% Pt, (38 x 0.2mm) | | |
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| Platinum Target, 99.95% Pt, (38 x 0.4mm) | | |
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| Platinum/Palladium Target, 99.99% Pt:Pd 80:20 ratio, (38 x 0.2mm) | | |
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| Platinum/Palladium Target, 99.99% Pt:Pd 80:20 ratio, (38 x 0.4mm) | | |
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| Silver Target, 99.95% Ag, (38 x 1.0mm) | | |
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| Tantalum Target, 99.95% Ta, (38 x 1.0mm) | | |
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| Tin Target, 99.95% Sn, (38 x 0.5mm) | | |
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| Titanium Target, 99.998% Ti, (38 x 0.5mm) | | |
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| Tungsten Target, 99.95% W, (38 x 3.2mm) | | |
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For convenient rest or safe storage; the Bell Jar Stand holds 10" or 12"
sizes (25 or 30cm) Bell Jar is inverted into the Stand. Dimensions: 8-1/4" high
x 13-1/2" base (21 x 34cm).
The Bell Jar Guard is constructed of clear, light weight, scratch resistant polycarbonate.
It will cover a 12" bell jar and is designed to rest on the baseplate of the
Desktop Modular Coating System 308R or the 9511 Feedthrough Collar. Dimensions: 12-5/8
OD x 14-5/8" high (32.1 x 37.1cm).