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Evaporation with Carbon Rods versus Carbon Fibers

208C High Vacuum Turbo Carbon Coater

208C High Vacuum Turbo Carbon Coater, standard configuration, shown with optional Thickness Monitor MTM-10


208C High Vacuum Turbo Carbon Coater with optional Rotary-Planetary-Tilting Stage,
Thickness Monitor MTM-10, Metal Evaporation Accessory and Auxiliary Power Supply

The 208C High Vacuum Turbo Carbon Coater from Cressington offers high quality carbon coating techniques for TEM, STEM, SEM, EDS/WDS, EBSD and microprobe applications. The compact, turbo pumped system requires only a standard power outlet and occupies minimal bench top space. The practical chamber size of 150mm diameter allows for rapid pump down and coating cycle times of around 10 minutes. The use of ultra purity carbon rods in a high vacuum chamber gives the high quality coating needed for critical TEM, EBSD, high resolution SEM and microprobe work. The modular design permits rapid change between a variety of applications with optimized conditions. Optional accessories for the 208C are:

• Metal evaporation module for shadowing techniques can be mounted adjacent to the carbon source
• Dedicated EM aperture cleaning head
• Glow discharge head for cleaning TEM grids
• Auxiliary Power Unit to drive the Metal Evaporation, Aperture cleaning and Glow Discharge accessories
• Rotary-Tilting stage for TEM shadowing techniques or coating large samples like microscope slides for carbon support films
• Rotary-Planetary-Tilting stage for multiple sample coating for SEM, EDS/WDS and EBSD applications and/or enhanced uniformity
• MTM-10 thickness monitor unit for precise and reproducible coating thickness

Main Features of the 208C

• Voltage controlled rod source gives multiple evaporation capabilities
• Feedback loop enables precise and consistent coating thickness
• Choice of operation methods for optimized operation
• Automatic evaporation control gives ease of use in busy environments
• Low cost, high resolution thickness monitor ensures reproducible results
• 80 ltr/sec turbo pump on a 150mm diameter chamber gives rapid pumpdown
• Optional Dry Scroll Pump available
• Reduces operating cost in several ways:

Carbon Evaporation Supply

The 208C uses a unique fully integrated electronic feedback-controlled power design for the rod fed Bradley type carbon evaporation source. Current and voltage are monitored by sensor wires in the evaporation head where the evaporation source is part of the feedback loop. This feature gives the conventional rod fed carbon source unusual stability and reproducibility. The carbon source uses two-step ultra pure carbon rods. The evaporation source can be operated in manual "pulse" or manual "continuous" modes. The pulsed mode, when used in conjunction with the optional MTM-10 high resolution thickness monitor, gives absolute control over the desired thickness of the carbon coating. The automatic mode lets the user set the voltage and time, which together with the two-step rods gives consistent coating combined with ease of operation.

208C Specimen Chamber and Optional Special Stages

The modular design of this practical-size chamber accepts a range of attachments, which can be readily implemented. The telescopic pillar gives a simple, rapid adjustment from long to short working distances to change the evaporation rate. The unique standard HIGH-VAC / LOW-VAC pressure adjustment system utilizes a precision needle valve. HIGH-VAC is used for highest quality carbon films such as for TEM applications. LOW-VAC is used for Glow Discharge cleaning of TEM grids or for carbon coating of highly topographic SEM specimens. For SEM, EDS/WDS and microprobe analysis applications, the Rotary-Planetary-Tilting stage with variable speed, adjustable tilt and 4 specimen holders ensures uniform coating on multiple samples. The Rotary-Tilting stage is specifically designed for TEM and analytical applications and holds either 25 x 75mm (1" x 3") glass slide, 7 standard 12.7mm pin stubs or 3 sample holders. Both stages are mounted on a mounting collar and can be readily implemented in the chamber.