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Calibration Overview
UHV-EL Reference Elements

FIB and Ion Beam Sputter Standards

FIB, Focus Ion Beam Sputter Standards

Ion Sputter Standards manufactured to the highest precision for calibrating the sputtering rate of sputter ion guns. Thin films of Tantalum Pentoxide (Ta2O5) and Nickel/Chromium (Ni/Cr) are available, to calibrate the sputtering rate for different materials.


Tantalum Pentoxide (Ta2O5)
Film of tantalum pentoxide (~100nm) is anodically grown on 0.5mm thick tantalum foil. The size of the standard is ~37 x 37mm. The thickness accuracy is ~5%.

Prod # Description Unit Price Order / Quote
612-30 Tantalum Pentoxide Ion Sputter Calibration Standard, Ta2O5 (~100nm) on 37 x 37mm Ta foil each $330.00
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Nickel / Chromium
Consisting of 12 alternating layers: 6 layers of Cr (~53nm) and 6 layers of Ni (~64nm) for a total thickness of ~700nm with a maximum variation across the 75mm production wafer of ±2%. Standard is on a 10 x 30mm section of a polished silicon wafer. The mass density of Cr and Ni was measured using electron beam excitation and measuring characteristic X-ray intensities.

Prod # Description Unit Price Order / Quote
612-40 Nickel / Chromium Ion Sputter Calibration Standard, Ni / Cr (12 layers) on 10 x 30mm Si each $660.00
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