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UHV-EL Reference Elements
Ion Sputter Standards manufactured to the highest precision for calibrating sputter ion guns. Thin films of Silicon Dioxide (SiO2), Silicon Nitride (Si3N4), Tantalum Pentoxide (Ta2O5) and Nickel/Chromium (NiCr-3) are available.
Silicon Dioxide (SiO2)
Silicon wafers with thin films of silicon dioxide are available in thicknesses of 23, 50, 97 and 102.9nm. The oxide films are grown with a wet oxygen process, which insures a higher degree of uniformity than available using other processes. The wafers are 4" in diameter.
| Prod # | Description | Unit | Price | Order / Quote |
|---|---|---|---|---|
612-11 | Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (23 ± 0.23 nm) on 4" Si wafer | each | $975.00 | |
| 612-12 | Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (50 ± 2.5 nm) on 4" Si wafer | each | 475.00 | |
| 612-13 | Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (97 ± 3.8 nm) on 4" Si wafer | each | 475.00 | |
| 612-14 | Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (102.9 ± 2.5 nm) on 4" Si wafer | each | 975.00 |
Silicon Nitride (Si3N4)
100nm Silicon Nitride (CVD) films deposited on a ~1 x 3cm piece of silicon wafer.
| Prod # | Description | Unit | Price | Order / Quote |
|---|---|---|---|---|
612-20 | Silicon Nitride Ion Sputter Calibration Standard, Si3N4 on 1x3cm Si | each | $300.00 |
Tantalum Pentoxide (Ta2O5)
Films of tantalum
pentoxide (~100nm) are anodically grown on 0.5mm thick tantalum foil. The standards are ~37x37mm. The thickness accuracy is ~5%.
| Prod # | Description | Unit | Price | Order / Quote |
|---|---|---|---|---|
612-30 | Tantalum Pentoxide Ion Sputter Calibration Standard, Ta2O5 (~100nm) on 37x37mm Ta foil | each | $300.00 |
Nickel / Chromium
Consisting of 12 alternating layers: 6 layers of Cr (~53nm) and 6 layers of Ni (~64nm) for a total thickness of ~700nm with a maximum variation across the 75mm production wafer of ±2%. Standard is on a 1x3cm section of a polished silicon wafer. The mass density of Cr and Ni was measured using electron beam excitation and measuring characteristic X-ray intensities.
| Prod # | Description | Unit | Price | Order / Quote |
|---|---|---|---|---|
612-40 | Nickel / Chromium Ion Sputter Calibration Standard, Ni / Cr (12 layers) on 1x3cm Si | each | $600.00 |