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A precision, holographic pattern featuring high accuracy, usability and stability.
This specimen provides excellent contrast in back-scatter as well as secondary electron
imaging. Its moderate ridge height makes it convenient for AFM. It provides accurate
calibration for high resolution, nanometer-scale measurements.
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Period: 292 nm pitch, one-dimensional grating. Accurate to +/- 1% (3 standard deviations).
Surface: Titanium lines on silicon wafer, 3 x 4mm. Line height (about 30 nm) and line width (about 130 nm) are not calibrated.
Characteristics: High contrast, excellent edge definition. Use SEM beam voltages from under 1 kV to 30 kV. Useful
from 5,000x to over 200,000x. In AFM, use in contact, tapping and other modes with image sizes from 500nm to 20nm.
In Auger and Focused Ion Beam (FIB), use similar conditions as for SEM. Available mounted or unmounted to accommodate
all SEM stages. Available mounted on 12 mm steel discs for AFM use.
Usability: The calibrated pattern covers the entire chip. There is sufficient usable area to make tens of thousands
of measurements without reusing any areas altered or contaminated by previous scans.
The calibration reference comes with a non-traceable, manufacturer's certificate. This states the average period,
based on batch measurements.
The Traceable, Certified Standard is a select grade. Each standard is individually measured in comparison with
a similar specimen calibrated at PTB. (PTB, Physikalisch-Technische Bundesanstalt, is the German counterpart of NIST.)
The uncertainty of single pitch values is typically +/- 2 nm (95% confidence interval). Multi-pitch measurements provide
the usual square-root of N improvement in precision.
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| Prod # | Description | Unit | Price | Order / Quote |
| SEM Reference Standards, non-certified, unmounted and mounted: |
| 300nm High Resolution SEM Reference Standard, Unmounted | | |
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| 300nm High Resolution SEM Reference Standard on Mount A | | |
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| 300nm High Resolution SEM Reference Standard on Mount B | | |
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| 300nm High Resolution SEM Reference Standard on Mount C | | |
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| 300nm High Resolution SEM Reference Standard on Mount D | | |
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| 300nm High Resolution SEM Reference Standard on Mount E | | |
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| 300nm High Resolution SEM Reference Standard, You Supply Mount | | |
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| 300nm High Resolution SEM Reference Standard on Mount K | | |
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| 300nm High Resolution SEM Reference Standard on Mount L | | |
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| 300nm High Resolution SEM Reference Standard on Mount M | | |
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| 300nm High Resolution SEM Reference Standard on Mount O | | |
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| 300nm High Resolution SEM Reference Standard on Mount P | | |
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| AFM Reference Standard, non-certified, mounted on disk: |
| 300nm High Resolution AFM Reference Standard on 12mm steel disk, non-certified | | |
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| SEM Reference Standards, Certified Traceable, Calibration Certificate Provided, unmounted and mounted: |
| 300nm High Resolution SEM Reference Standard, Certified, unmounted | | |
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| 300nm High Resolution SEM Reference Standard, Certified, on Mount A | | |
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| 300nm High Resolution SEM Reference Standard, Certified, on Mount B | | |
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| 300nm High Resolution SEM Reference Standard, Certified, on Mount C | | |
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| 300nm High Resolution SEM Reference Standard, Certified, on Mount D | | |
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| 300nm High Resolution SEM Reference Standard, Certified, on Mount E | | |
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| 300nm High Resolution SEM Reference Standard, Certified, You Supply Mount | | |
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| 300nm High Resolution SEM Reference Standard, Certified, on Mount K | | |
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| 300nm High Resolution SEM Reference Standard, Certified, on Mount L | | |
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| 300nm High Resolution SEM Reference Standard, Certified, on Mount M | | |
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| 300nm High Resolution SEM Reference Standard, Certified, on Mount O | | |
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| 300nm High Resolution SEM Reference Standard, Certified, on Mount P | | |
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| AFM Reference Standard, Certified Traceable, Calibration Certificate Provided, mounted on disk: |
| 300nm High Resolution AFM Reference Standard on 12mm steel disk, Certified | | |
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