Ion Sputter Standards manufactured to the highest precision for calibrating sputter ion guns.
Thin film of Silicon Dioxide (SiO2),
Silicon Nitride (Si3N4),
Tantalum Pentoxide (Ta2O5)
and Nickel/Chromium (NiCr-3) are available. Uniformity is ~5%.
Silicon Dioxide (SiO2)
Silicon wafers with thin films of silicon
dioxide are available in thicknesses of 20, 32, 120 and 500nm. These oxide films are grown with a wet oxygen process which insures
a higher degree of uniformity than available using other processes. The wafers are 4" in diameter.
| Prod # | Description | Unit | Price | Order / Quote |
| Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (~20nm) on 4" Si wafer | | |
|
| Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (~32nm) on 4" Si wafer | | |
|
| Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (~120nm) on 4" Si wafer | | |
|
| Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (~500nm) on 4" Si wafer | | |
|
Silicon Nitride (Si3N4)
100nm Silicon Nitride
(CVD) films deposited on a ~1 x 3cm piece of silicon wafer
| Prod # | Description | Unit | Price | Order / Quote |
| Silicon Nitride Ion Sputter Calibration Standard, Si3N4 on 1x3cm Si | | |
|
Tantalum Pentoxide (Ta2O5)
Films of tantalum
pentoxide (~100nm) are anodically grown on 0.5mm thick tantalum foil. The standards are ~37x37mm. The thickness accuracy is ~5%.
| Prod # | Description | Unit | Price | Order / Quote |
| Tantalum Pentoxide Ion Sputter Calibration Standard, Ta2O5 (~100nm) on 37x37mm Ta foil | | |
|
Nickel / Chromium (NiCr-3)
Consisting of 12 alternating layers: 6 layers of Cr (~53nm) and 6
layers of Ni (~64nm) for a total thickness of ~700nm with a maximum variation across the 75mm production wafer of ±2%. Standard
is on a 1x3cm section of a polished silicon wafer. The mass density of Cr and Ni was measured using electron beam excitation and measuring
characteristic x-ray intensities.
| Prod # | Description | Unit | Price | Order / Quote |
| Nickel / Chromium Ion Sputter Calibration Standard, Ni / Cr (12 layers) on 1x3cm Si | | |
|
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Page Last Updated: December 19, 2008