Ion Sputter Standards manufactured to the highest precision for calibrating the sputtering rate of sputter ion guns. Thin films of Silicon Dioxide (SiO2),
Silicon Nitride (Si3N4),
Tantalum Pentoxide (Ta2O5)
and Nickel/Chromium (NiCr-3) are available, to calibrate the sputtering rate for different materials.
Silicon Dioxide (SiO2)
Silicon wafers with thin films of silicon dioxide are available in thicknesses of 23, 50, 97 and 102.9nm. The oxide films are grown with a wet oxygen process, which insures a higher degree of uniformity than available using other processes. The wafers are 4" in diameter.
| Prod # | Description | Unit | Price | Order / Quote |
| Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (23 ± 0.23 nm) on 4" Si wafer | | |
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| Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (50 ± 2.5 nm) on 4" Si wafer | | |
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| Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (97 ± 3.8 nm) on 4" Si wafer | | |
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| Silicon Dioxide Ion Sputter Calibration Standard, SiO2 (102.9 ± 2.5 nm) on 4" Si wafer | | |
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Silicon Nitride (Si3N4)
100nm Silicon Nitride (CVD) films deposited on a ~1 x 3cm piece of silicon wafer.
| Prod # | Description | Unit | Price | Order / Quote |
| Silicon Nitride Ion Sputter Calibration Standard, Si3N4 on 1x3cm Si | | |
|
Tantalum Pentoxide (Ta2O5)
Films of tantalum
pentoxide (~100nm) are anodically grown on 0.5mm thick tantalum foil. The standards are ~37x37mm. The thickness accuracy is ~5%.
| Prod # | Description | Unit | Price | Order / Quote |
| Tantalum Pentoxide Ion Sputter Calibration Standard, Ta2O5 (~100nm) on 37x37mm Ta foil | | |
|
Nickel / Chromium
Consisting of 12 alternating layers: 6 layers of Cr (~53nm) and 6 layers of Ni (~64nm) for a total thickness of ~700nm with a maximum variation across the 75mm production wafer of ±2%. Standard is on a 1x3cm section of a polished silicon wafer. The mass density of Cr and Ni was measured using electron beam excitation and measuring characteristic X-ray intensities.
| Prod # | Description | Unit | Price | Order / Quote |
| Nickel / Chromium Ion Sputter Calibration Standard, Ni / Cr (12 layers) on 1x3cm Si | | |
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Page Last Updated: May 25, 2011